SEMICAPS Photon Emission Microscope (PEM) is a failure analysis
technique for localization of defects in semiconductor
devices. Capable of quickly locating leaky junctions, contact
spiking (due to ESD), latch-up, oxide breakdown, and other current
leakage phenomena that produce light emissions.
System sensitivity plays a pivotal role in photon emission and is
imperative for detection of the faint emissions.
SEMICAPS recognizes this important and essential requirement and we
offer a high performance, highly sensitive system,
that is unmatched when it comes to sensitivity.
CRITICAL DESIGN CONSIDERATIONS
Optics
SEMICAPS designs to optimize and enhance the system for maximum
photon throughput to the detector.
High Numerical Aperture & Long Working Distance Objectives Lens
The NA of the objective lens is critical. Higher NA lens yield
better light collecting efficiency. Long working distance lens have
better depth of focus and allows microprobing of devices
High Sensitivity Macro Lens
To provide a global view of the entire device, SEMICAPS offers 1x
macro lens with a high NA of 0.4.
Optimized Tube Lens Design
For maximum light throughput, SEMICAPS PEM uses large diameter tube
lens to minimize light loss and prevents vignetting, thus improving
sensitivity.
Description